CHELATE RESIN

The present application relates to novel chelate resins which contain, as a functional group, quaternary nitrogen atoms in structures of the general formula (I) in which at least one of the radicals R1 to R3 represents an optionally substituted radical of the series consisting of picolyl, methylquin...

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Bibliographische Detailangaben
Hauptverfasser:	KLIPPER, REINHOLD, SCHELHAAS, MICHAEL, ZARGES, WOLFGANG, NEUMANN, STEFAN, ROSSONI, DUILIO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOSITIONS BASED THEREON FERROUS OR NON-FERROUS ALLOYS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PRETREATMENT OF RAW MATERIALS PRODUCTION AND REFINING OF METALS SEPARATION THEIR PREPARATION OR CHEMICAL WORKING-UP THEIR RELEVANT APPARATUS TRANSPORTING TREATMENT OF ALLOYS OR NON-FERROUS METALS TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:	The present application relates to novel chelate resins which contain, as a functional group, quaternary nitrogen atoms in structures of the general formula (I) in which at least one of the radicals R1 to R3 represents an optionally substituted radical of the series consisting of picolyl, methylquinoline or methylpiperidine, m represents an integer from 1 to 4 and M represents the polymer matrix and X represents a counterion of the series consisting of hydroxide OH-, halide, preferably Cl-, Br-, or sulphate SO42-, a process for their preparation and the use thereof, in particular the use of the novel chelate resins in hydrometallurgy and electroplating.