OPTICAL CHARACTERISTIC MEASURING METHOD, OPTICAL CHARACTERISTIC ADJUSTING METHOD, EXPOSING DEVICE, EXPOSING METHOD, AND EXPOSING DEVICE MANUFACTURING METHOD

There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging, on the first plane, a first are...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OOKI, Hiroshi, NAKAMURA, Ayako
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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