OPTICAL CHARACTERISTIC MEASURING METHOD, OPTICAL CHARACTERISTIC ADJUSTING METHOD, EXPOSING DEVICE, EXPOSING METHOD, AND EXPOSING DEVICE MANUFACTURING METHOD

There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging, on the first plane, a first are...

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Bibliographische Detailangaben
Hauptverfasser:	OOKI, Hiroshi, NAKAMURA, Ayako
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging, on the first plane, a first area through which a measuring light passes or by which the measuring light is reflected (S20); arranging a second area, through which the measuring light passes or by which the measuring light is reflected, on the second plane at a position corresponding to the first area (S21); and detecting, via one of the first area and the second area, a light amount of the measuring light via the optical system and the other of the first area and the second area (S23, S24); wherein at least one of the first area and the second area has a shape such that a light amount, of the measuring light which passes or which is reflected via the optical system, is changed depending on the optical characteristic.