Alkaline developable super-hydrophobic photosensitive materials

Disclosed is a super-hydrophobic photosensitive resin composition suitable for forming barrier ribs for LCD pixels during a process for fabricating an LCD using an ink jet printing step. Also, disclosed is a transparent negative photosensitive developable super-hydrophobic material for ink jet print...

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Bibliographische Detailangaben
Hauptverfasser: KIM, SEUNG KEUN, HAN, SEOK, LEE, HAG JU, LEE, MOO YOUNG, PARK, CHUN GEUN, SUNG, IN KYUNG
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Disclosed is a super-hydrophobic photosensitive resin composition suitable for forming barrier ribs for LCD pixels during a process for fabricating an LCD using an ink jet printing step. Also, disclosed is a transparent negative photosensitive developable super-hydrophobic material for ink jet printing, which has super-hydrophobicity characterized by a contact angle value of > 90° to distilled water and a contact angle value of > 35° to ethyl cellosolve, is sufficiently dissolved into a developing agent before and after exposure, and can realize a micropattern with a size up to 10 µm. A photosensitive resin composition comprising a resin part and a multi-functional (meth)acrylate is subjected to UV curing using a photoinitiator and thermal curing to form the barrier ribs for LCD pixels, wherein the resin part comprises a copolymer system containing a C 4 -C 30 saturated or unsaturated fluoro-substituted hydrocarbyl group and saturated or unsaturated hydrocarbyl group introduced thereto to provide super-hydrophobicity, a unit functioning as a reactive site and having a reactive group such as an epoxy group, methacrylate group or acrylate group as a moiety that undergoes a reaction under heat or light, and a unit having a carboxylic acid group so as to allow post-exposure development.