DEACTIVATION RESISTANT PHOTOCATALYST AND METHOD OF PREPARATION

A photocatalyst formed using a sol-gel process provides high photo activity, increased photocatalyst lifetime, and improved resistance to performance degradation caused by siloxane-based contaminants. The photocatalyst comprises particles of photocatalytically-active oxide having a surface area of g...

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Bibliographische Detailangaben
Hauptverfasser: VANDERSPURT, THOMAS, HENRY, SCHMIDT, WAYDE, R, ZHITNIK, STEVEN, M, HUGENER-CAMPBELL, TREESE
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A photocatalyst formed using a sol-gel process provides high photo activity, increased photocatalyst lifetime, and improved resistance to performance degradation caused by siloxane-based contaminants. The photocatalyst comprises particles of photocatalytically-active oxide having a surface area of greater than about 190 m2/cm3 of skeletal volume and having pores with a diameter of about 4 nm or greater. The particles are made up of wide band gap semiconductor crystallites that have a diameter of greater than about 2 nm.