METHOD FOR QUANTITATIVE ANALYSIS OF A MATERIAL
A method and apparatus for quantitative analysis of a material in which an electron beam is caused to impinge upon the material are described. The method comprises detecting low loss electrons (LLEs) received from a first region of the material due to interaction with the electron beam and generatin...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A method and apparatus for quantitative analysis of a material in which an electron beam is caused to impinge upon the material are described. The method comprises detecting low loss electrons (LLEs) received from a first region of the material due to interaction with the electron beam and generating corresponding LLE data. The method further comprises detecting x-rays received from a second region of the material due to interaction with the electron beam and generating corresponding x-ray data, wherein the first and second regions overlap, and analysing the LLE data together with the x-ray data so as to generate compositional data representative of the composition of the first region. |
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