Device and method for gas supersaturating fluid
The invention relates to a device and method for gas-supersaturating fluid, the device comprising: a fluid supply (350); a chamber (300) having a first inlet, a second inlet, and an outlet; a pump (340) coupled to receive fluid from the fluid supply and to deliver the fluid to the first inlet of the...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention relates to a device and method for gas-supersaturating fluid, the device comprising:
a fluid supply (350); a chamber (300) having a first inlet, a second inlet, and an outlet; a pump (340) coupled to receive fluid from the fluid supply and to deliver the fluid to the first inlet of the chamber; a gas supply (310) coupled to deliver gas to the second inlet of the chamber, the gas supply maintaining pressure within the chamber at a predetermined level; and an atomizer nozzle (320) coupled to the first inlet of the chamber, the atomizer nozzle creating a droplet pattern (330) of the fluid in the gas within the chamber to diffuse the gas into the fluid to create a gas-supersaturated fluid, the gas-supersaturated fluid collecting within the chamber below the atomizer nozzle and being removable from the chamber via the outlet. |
---|