Electrolytic Tin Plating Solution and Electrolytic Tin Plating Method
A plating solution and a plating method, which does not use a complexing agent and which provides favorable solder wetting properties and an extremely low coupling rate when electrolytic tin plating is performed, and particularly when electrolytic tin plating is performed using a barrel plating meth...
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creator | Imanari, Masaaki Ting, Fai Lung Ohta, Yasuo Shimazu, Motoya |
description | A plating solution and a plating method, which does not use a complexing agent and which provides favorable solder wetting properties and an extremely low coupling rate when electrolytic tin plating is performed, and particularly when electrolytic tin plating is performed using a barrel plating method. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP2141261B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP2141261B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP2141261B13</originalsourceid><addsrcrecordid>eNrjZHB1zUlNLinKz6ksyUxWCMnMUwjISSzJzEtXCM7PKS3JzM9TSMxLUcCpyje1JCM_hYeBNS0xpziVF0pzMyi4uYY4e-imFuTHpxYXJCan5qWWxLsGGBmaGBqZGToZGhOhBAB60zKD</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Electrolytic Tin Plating Solution and Electrolytic Tin Plating Method</title><source>esp@cenet</source><creator>Imanari, Masaaki ; Ting, Fai Lung ; Ohta, Yasuo ; Shimazu, Motoya</creator><creatorcontrib>Imanari, Masaaki ; Ting, Fai Lung ; Ohta, Yasuo ; Shimazu, Motoya</creatorcontrib><description>A plating solution and a plating method, which does not use a complexing agent and which provides favorable solder wetting properties and an extremely low coupling rate when electrolytic tin plating is performed, and particularly when electrolytic tin plating is performed using a barrel plating method.</description><language>eng ; fre ; ger</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170301&DB=EPODOC&CC=EP&NR=2141261B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170301&DB=EPODOC&CC=EP&NR=2141261B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Imanari, Masaaki</creatorcontrib><creatorcontrib>Ting, Fai Lung</creatorcontrib><creatorcontrib>Ohta, Yasuo</creatorcontrib><creatorcontrib>Shimazu, Motoya</creatorcontrib><title>Electrolytic Tin Plating Solution and Electrolytic Tin Plating Method</title><description>A plating solution and a plating method, which does not use a complexing agent and which provides favorable solder wetting properties and an extremely low coupling rate when electrolytic tin plating is performed, and particularly when electrolytic tin plating is performed using a barrel plating method.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB1zUlNLinKz6ksyUxWCMnMUwjISSzJzEtXCM7PKS3JzM9TSMxLUcCpyje1JCM_hYeBNS0xpziVF0pzMyi4uYY4e-imFuTHpxYXJCan5qWWxLsGGBmaGBqZGToZGhOhBAB60zKD</recordid><startdate>20170301</startdate><enddate>20170301</enddate><creator>Imanari, Masaaki</creator><creator>Ting, Fai Lung</creator><creator>Ohta, Yasuo</creator><creator>Shimazu, Motoya</creator><scope>EVB</scope></search><sort><creationdate>20170301</creationdate><title>Electrolytic Tin Plating Solution and Electrolytic Tin Plating Method</title><author>Imanari, Masaaki ; Ting, Fai Lung ; Ohta, Yasuo ; Shimazu, Motoya</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP2141261B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2017</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>Imanari, Masaaki</creatorcontrib><creatorcontrib>Ting, Fai Lung</creatorcontrib><creatorcontrib>Ohta, Yasuo</creatorcontrib><creatorcontrib>Shimazu, Motoya</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Imanari, Masaaki</au><au>Ting, Fai Lung</au><au>Ohta, Yasuo</au><au>Shimazu, Motoya</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Electrolytic Tin Plating Solution and Electrolytic Tin Plating Method</title><date>2017-03-01</date><risdate>2017</risdate><abstract>A plating solution and a plating method, which does not use a complexing agent and which provides favorable solder wetting properties and an extremely low coupling rate when electrolytic tin plating is performed, and particularly when electrolytic tin plating is performed using a barrel plating method.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
title | Electrolytic Tin Plating Solution and Electrolytic Tin Plating Method |
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