GLAZING WITH LOW EMISSIVITY

Glazing (I), coated with thin, vacuum-deposited layers including silver-based layer(s) and dielectric layer(s), includes a dielectric layer (II) (underlying a silver layer) of titanium oxide or oxynitride containing other metal(s) and/or silicon in an amount sufficient to prevent transformation of the crystallographic structure of (II) during hot processing. Glazing (I), coated with a set of thin, vacuum-deposited layers including silver-based layer(s) and dielectric layer(s), includes at least one dielectric layer (II)(underlying at least one silver layer) containing titanium oxide or oxynitride of the TiMO x or TiMO xN y type, where M represents one or more of metals and/or silicon, present in an amount sufficient to prevent significant transformation of the crystallographic structure of (II) during hot processing.