Diode with stress reducing means
The component has lead-free high-temperature resistant extensive connections (4, 5) that are formed between a semiconductor chip (3) and parts (1, 6) of the component. The semiconductor chip is a silicon semiconductor chip and parts are copper parts. The connections are formed as low-temperature con...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng ; fre ; ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The component has lead-free high-temperature resistant extensive connections (4, 5) that are formed between a semiconductor chip (3) and parts (1, 6) of the component. The semiconductor chip is a silicon semiconductor chip and parts are copper parts. The connections are formed as low-temperature connection layers that are formed using low-temperature connection technique. Silicon carbide and gallium nitrides are utilizable as semiconductor chip. The layers are formed within silicon surfaces of the chip. |
---|