Method for bonding a tantalum structure to a cobalt-alloy substrate

A method for bonding a porous tantalum structure (10) to a substrate (12) is provided. The method comprises providing a substrate (12) comprising cobalt or a cobalt-chromium alloy; an interlayer (16) consisting essentially of at least one of hafnium, manganese, niobium, palladium, zirconium, titaniu...

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Bibliographische Detailangaben
Hauptverfasser: PEEK, LAWRENCE F, GORHE, DEVENDRA, HIPPENSTEEL, GREGORY, ALLEN, STEVE M, ANDERSON, JEFFREY P
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:A method for bonding a porous tantalum structure (10) to a substrate (12) is provided. The method comprises providing a substrate (12) comprising cobalt or a cobalt-chromium alloy; an interlayer (16) consisting essentially of at least one of hafnium, manganese, niobium, palladium, zirconium, titanium, or alloys or combinations thereof; and a porous tantalum structure (10). Heat and pressure are applied to the substrate (12), the interlayer (16), and the porous tantalum structure (10) to achieve solid-state diffusion between the substrate (12) and the interlayer (16) and between the interlayer (16) and the porous tantalum structure (10).