Structured Depilatory Compositions

Provided are compositions comprising a depilatory active; and a surfactant, wherein the composition has a Yield Stress of from about 1 Pascal (Pa) to about 1500 Pa, and methods of use thereof.

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Bibliographische Detailangaben
Hauptverfasser:	GUNN, EUEN, T, TYERECH, MICHAEL R
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	HUMAN NECESSITIES HYGIENE MEDICAL OR VETERINARY SCIENCE PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS
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Beschreibung
Zusammenfassung:	Provided are compositions comprising a depilatory active; and a surfactant, wherein the composition has a Yield Stress of from about 1 Pascal (Pa) to about 1500 Pa, and methods of use thereof.