DEVICE FOR PLASMA TREATMENT AT ATMOSPHERIC PRESSURE

A device (1) for plasma treatment comprises an electrode (2) having a surface (14) covered by a dielectric barrier (3), and an AC high voltage source (6) for applying an AC high voltage to the electrode (2) to bring about a dielectric barrier discharge (9) in a gas (10) at atmospheric pressure prese...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KAEMLING, ANDY, BORN, STEFAN, VIOEL, WOLFGANG
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A device (1) for plasma treatment comprises an electrode (2) having a surface (14) covered by a dielectric barrier (3), and an AC high voltage source (6) for applying an AC high voltage to the electrode (2) to bring about a dielectric barrier discharge (9) in a gas (10) at atmospheric pressure present in front of the dielectric barrier (3) in order to generate a plasma. To the end of generating the plasma even without a counter-electrode for the electrode (2), pointed tips are distributed over the surface (14) of the electrode (2), these pointed tips pointing towards the gas (10) in front of the dielectric barrier (3), whereas the dielectric barrier (3) has a smooth outer surface (15) facing the gas (10).