COMPOSITION FOR REMOVING RESIDUE FROM WIRING BOARD AND CLEANING METHOD

A composition for removing a residue from a wiring board containing an oxidizing agent and an azole compound and having a pH of from 1 to 7 and a cleaning method of a wiring board for removing a residue after dry etching by using this composition are provided. By using the composition for removing a...

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Bibliographische Detailangaben
Hauptverfasser: MATSUNAGA, HIROSHI, OHTO, MASARU, KUWABARA, EIKO, KASHIWAGI, HIDEO
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:A composition for removing a residue from a wiring board containing an oxidizing agent and an azole compound and having a pH of from 1 to 7 and a cleaning method of a wiring board for removing a residue after dry etching by using this composition are provided. By using the composition for removing a residue of the present invention, in manufacturing a wiring board, residues remaining after dry etching which are derived from a resist or metals can be effectively removed without corroding titanium or titanium alloys with high corrosiveness. In particular, a semiconductor device using a wiring board containing titanium or titanium alloys can be efficiently manufactured.