METHOD AND APPARATUS FOR DETERMINING A RELATIVE POSITION OF A PROCESSING HEAD WITH RESPECT TO A SUBSTRATE WITH A STRUCTURE
A method and apparatus wherein a substrate is provided with a preformatted structure, with structural elements arranged in a matrix, wherein the matrix extends in an X-direction and Y-direction, wherein a processing head is provided, wherein a camera is provided which is connected with the processin...
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Format: | Patent |
Sprache: | eng ; fre ; ger |
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Zusammenfassung: | A method and apparatus wherein a substrate is provided with a preformatted structure, with structural elements arranged in a matrix, wherein the matrix extends in an X-direction and Y-direction, wherein a processing head is provided, wherein a camera is provided which is connected with the processing head and which comprises at least one series of sensors arranged along a main line, wherein the camera scans the substrate and thereby provides at least one one-dimensional camera signal, wherein, for real-time determining at least the X-position and the Y-position of the structure with respect to the camera, the said main line includes an angle with the X-direction and with the Y-direction, wherein the angle is chosen such that the camera signal contains spatially separated X-position information and Y-position information and that the X-position information and the Y-position information can be separated from the sensor signal with the aid of signal processing. |
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