Integrated method for removal of halogen residues from etched substrates by thermal process

A method and system for removing volatile residues from a substrate are provided. In one embodiment, the volatile residues removal process is performed en-routed in the system while performing a halogen treatment process on the substrate. The volatile residues removal process is performed in the sys...

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Bibliographische Detailangaben

Hauptverfasser:	HOOGENSEN, BRETT CHRISTIAN, BAHNG, KENNETH J, DAVIS, MATTHEW FENTON, LILL, THORSTEN, KAWAGUCHI, MARK NAOSHI, LO, KIN PONG, WEN, SANDY M, KIM, STEVEN H
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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