Process for the production of a chip by using immersion lithography

Process for the production of a chip by using immersion lithography

The invention relates to a process for the production of a chip by using immersion lithography, comprising the step of forming a photoresist layer on a substrate, wherein the photoresist layer is prepared from a photoresist composition comprising: (a) a binder; (b) a photoactive component. (c) a flu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHAHAB, JAHROMI, LYAPUNOV, ANDREY YAROSLAVOVICH, DERKS, FRANCISCUS JOHANNES MARIE
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:The invention relates to a process for the production of a chip by using immersion lithography, comprising the step of forming a photoresist layer on a substrate, wherein the photoresist layer is prepared from a photoresist composition comprising: (a) a binder; (b) a photoactive component. (c) a fluor containing compound.