THERMALLY DEVELOPABLE MATERIALS WITH ABRASION-RESISTANT BACKSIDE COATINGS

Thermally developable materials including photothermographic and thermographic materials have an outermost backside layer that includes a combination of a polysiloxane and a smectite clay that has been modified with a quaternary ammonium compound. The resulting outermost backside layers exhibit impr...

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Hauptverfasser:	LABELLE, GARY ELZEAR, KUB, THOMAS JOHN, ECKERT, KARISSA LYNN, LUDEMANN, THOMAS JAY, KOESTNER, ROLAND JOHN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY COLOUR PRINTING ELECTROGRAPHY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY LINING MACHINES PERFORMING OPERATIONS PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES STAMPS TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TRANSPORTING TYPEWRITERS
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Zusammenfassung:	Thermally developable materials including photothermographic and thermographic materials have an outermost backside layer that includes a combination of a polysiloxane and a smectite clay that has been modified with a quaternary ammonium compound. The resulting outermost backside layers exhibit improved abrasion resistance. The materials can also include conductive layers underneath the outermost backside layer.