METHOD FOR MASK INSPECTION FOR MASK DESIGN AND MASK PRODUCTION

METHOD FOR MASK INSPECTION FOR MASK DESIGN AND MASK PRODUCTION

An aerial image simulation is carried out of the mask design to produce a list of critical points or hotspots. Using this list the mask or test mask is analyzed using an Aerial Imaging Measurement System (AIMS) tool, whereby real aerial images are compared to simulate aerial images. The differences...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KALUS, CHRISTIAN, HARNISCH, WOLFGANG, SCHMOELLER, THOMAS, BOEHM, KLAUS, ZIBOLD, AXEL
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:An aerial image simulation is carried out of the mask design to produce a list of critical points or hotspots. Using this list the mask or test mask is analyzed using an Aerial Imaging Measurement System (AIMS) tool, whereby real aerial images are compared to simulate aerial images. The differences are used to improve the mask design.