ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS

ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS

An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: RAUM, MICHAEL, SOHMER, ALEXANDER, EGGER, RAFAEL, ULRICH, WILHELM, FELDMANN, HEIKO, HOEGELE, ARTUR, FUERTER, GERHARD, DODOC, AURELIAN
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator RAUM, MICHAEL
SOHMER, ALEXANDER
EGGER, RAFAEL
ULRICH, WILHELM
FELDMANN, HEIKO
HOEGELE, ARTUR
FUERTER, GERHARD
DODOC, AURELIAN
description An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1875292A2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1875292A2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1875292A23</originalsourceid><addsrcrecordid>eNrjZLD19PEJ9fX0cwzx9PdTCI4MDnH1VXDzD1JwVPD1dA7y9_EM8XAPcgzw8HRWcI0I8A8ODXJVcAwIcAxyDAkN5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BhhbmpkaWRo5GxkQoAQAdeSoJ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS</title><source>esp@cenet</source><creator>RAUM, MICHAEL ; SOHMER, ALEXANDER ; EGGER, RAFAEL ; ULRICH, WILHELM ; FELDMANN, HEIKO ; HOEGELE, ARTUR ; FUERTER, GERHARD ; DODOC, AURELIAN</creator><creatorcontrib>RAUM, MICHAEL ; SOHMER, ALEXANDER ; EGGER, RAFAEL ; ULRICH, WILHELM ; FELDMANN, HEIKO ; HOEGELE, ARTUR ; FUERTER, GERHARD ; DODOC, AURELIAN</creatorcontrib><description>An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.</description><language>eng ; fre ; ger</language><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080109&amp;DB=EPODOC&amp;CC=EP&amp;NR=1875292A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080109&amp;DB=EPODOC&amp;CC=EP&amp;NR=1875292A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RAUM, MICHAEL</creatorcontrib><creatorcontrib>SOHMER, ALEXANDER</creatorcontrib><creatorcontrib>EGGER, RAFAEL</creatorcontrib><creatorcontrib>ULRICH, WILHELM</creatorcontrib><creatorcontrib>FELDMANN, HEIKO</creatorcontrib><creatorcontrib>HOEGELE, ARTUR</creatorcontrib><creatorcontrib>FUERTER, GERHARD</creatorcontrib><creatorcontrib>DODOC, AURELIAN</creatorcontrib><title>ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS</title><description>An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.</description><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD19PEJ9fX0cwzx9PdTCI4MDnH1VXDzD1JwVPD1dA7y9_EM8XAPcgzw8HRWcI0I8A8ODXJVcAwIcAxyDAkN5mFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8a4BhhbmpkaWRo5GxkQoAQAdeSoJ</recordid><startdate>20080109</startdate><enddate>20080109</enddate><creator>RAUM, MICHAEL</creator><creator>SOHMER, ALEXANDER</creator><creator>EGGER, RAFAEL</creator><creator>ULRICH, WILHELM</creator><creator>FELDMANN, HEIKO</creator><creator>HOEGELE, ARTUR</creator><creator>FUERTER, GERHARD</creator><creator>DODOC, AURELIAN</creator><scope>EVB</scope></search><sort><creationdate>20080109</creationdate><title>ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS</title><author>RAUM, MICHAEL ; SOHMER, ALEXANDER ; EGGER, RAFAEL ; ULRICH, WILHELM ; FELDMANN, HEIKO ; HOEGELE, ARTUR ; FUERTER, GERHARD ; DODOC, AURELIAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1875292A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2008</creationdate><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>RAUM, MICHAEL</creatorcontrib><creatorcontrib>SOHMER, ALEXANDER</creatorcontrib><creatorcontrib>EGGER, RAFAEL</creatorcontrib><creatorcontrib>ULRICH, WILHELM</creatorcontrib><creatorcontrib>FELDMANN, HEIKO</creatorcontrib><creatorcontrib>HOEGELE, ARTUR</creatorcontrib><creatorcontrib>FUERTER, GERHARD</creatorcontrib><creatorcontrib>DODOC, AURELIAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RAUM, MICHAEL</au><au>SOHMER, ALEXANDER</au><au>EGGER, RAFAEL</au><au>ULRICH, WILHELM</au><au>FELDMANN, HEIKO</au><au>HOEGELE, ARTUR</au><au>FUERTER, GERHARD</au><au>DODOC, AURELIAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS</title><date>2008-01-09</date><risdate>2008</risdate><abstract>An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng ; fre ; ger
recordid cdi_epo_espacenet_EP1875292A2
source esp@cenet
subjects OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
title ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-22T01%3A08%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=RAUM,%20MICHAEL&rft.date=2008-01-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP1875292A2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true