ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS

ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS

An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an...

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Bibliographische Detailangaben
Hauptverfasser: RAUM, MICHAEL, SOHMER, ALEXANDER, EGGER, RAFAEL, ULRICH, WILHELM, FELDMANN, HEIKO, HOEGELE, ARTUR, FUERTER, GERHARD, DODOC, AURELIAN
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Beschreibung
Zusammenfassung:An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.