MICRO AND NANO STRUCTURES IN AN ELASTOMERIC MATERIAL

The invention relates to an elastomeric device (105), wherein the elastomeric device contains a relief structure with indentations with respect to the base (110), (102) and wherein selected ones of said indentations comprise at least two indentation depths (112), (108) and indentation widths (101),...

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Bibliographische Detailangaben
Hauptverfasser:	TVINGSTEDT, KRISTOFER, HAMEDI, MAHIAR, AASBERG, PETER, INGANAES, OLLE
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to an elastomeric device (105), wherein the elastomeric device contains a relief structure with indentations with respect to the base (110), (102) and wherein selected ones of said indentations comprise at least two indentation depths (112), (108) and indentation widths (101), (107). It also relates to a method of making a master for construction of said elastomeric device comprising a procedure to provide a pattern on a substrate of a suitable material. One step in. the construction of said elastomeric device comprises a molding procedure of an elastomer. Methods of using the elastomeric device in printing, fluidic control, sorting, lab-on-a-chip devices are also disclosed.