Non-active electrically structures of integrated electronic circuit

A method is described for manufacturing electrically non active structures of an integrated electronic circuit (1) formed on a semiconductor substrate (7) comprising first electrically active structures (2) which comprise electric components provided with conductive elements (16) of a first height (H1) projecting from said semiconductor substrate (7) and second electrically active structures (3) which comprise electric components provided with conductive elements (20) of a second height (H2) projecting from said semiconductor substrate (7), said first height being different from said second height, the method comprising the steps of: - introducing, into the integrated electronic circuit (1), electrically non active structures (4) to superficially uniform the integrated electronic circuit (1), - identifying, between the electrically non active structures (4), a first group (5) of electrically non active structures which is formed by those electrically non active structures comprised in areas (5a) which substantially extend for a predetermined radius (R) around each electric component belonging to the second electrically active structures (3), - identifying, between the electrically non active structures (4), a second group (6) of electrically non active structures comprising electrically non active structures not belonging to the first group (5) of electrically non active structures, - forming the electrically non active structures belonging to the first group (5) of electrically non active structures with elements (20a) projecting from the substrate (7) having a height equal to the second height (H2), - forming the electrically non active structures belonging to the second group (6) of electrically non active structures with elements (16a) projecting from the substrate (7) having a height equal to the first height (H1), the elements (16a, 20a) belonging to the first (5) and second group (6) of electrically non active structures being formed by means of respective photolithographic steps.