Magnet assembly for a sputter ion pump
The present invention concerns a sputter ion pump allowing attaining high pumping speeds even at low pressures, while keeping limited the size, weight and manufacturing cost of the pump itself. The sputter ion pump (1) in accordance with the invention has an improved magnet assembly comprising prima...
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| Format: | Patent |
| Sprache: | eng ; fre ; ger |
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| Zusammenfassung: | The present invention concerns a sputter ion pump allowing attaining high pumping speeds even at low pressures, while keeping limited the size, weight and manufacturing cost of the pump itself. The sputter ion pump (1) in accordance with the invention has an improved magnet assembly comprising primary magnets (9a, 9b), disposed on opposite ends of the pump cells, and secondary magnets (11; 11', 11") disposed on one side only of said pump cells, whereby the assembly exhibits an asymmetrical configuration. |
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