A METHOD AND APPARATUS FOR MEASUREMENT OF CHROMATIC ABERRATIONS OF OPTICAL SYSTEMS

Disclosed is a method of measuring an optical system artifact that includes introduction into an optical path of a measurement target ( 64 ) having at least one edge. Illuminating a section of the edge by a first illumination and illuminating another section of the edge by a second illumination. The...

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Bibliographische Detailangaben
Hauptverfasser:	LYUBCHIK, YAKOV, ASCHKENASY, JACQUES
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	Disclosed is a method of measuring an optical system artifact that includes introduction into an optical path of a measurement target ( 64 ) having at least one edge. Illuminating a section of the edge by a first illumination and illuminating another section of the edge by a second illumination. The difference of the edge images generated by the optical system ( 60 ) when illuminated by the first illumination and the second illumination measured in a predefined plane represents the optical artifact.