Systems and methods for creating mems gyros

Methods and systems for creating microelectromechanical system (MEMS) gyros. The methods and systems include generating a map of motor bias and creating MEMS gyros based on the map of motor bias to achieve a higher yield of usable MEMS gyros per wafer. The systems include a processor (33) with compo...

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Hauptverfasser: COUSSEAU, PETER L, DWYER, PAUL W
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:Methods and systems for creating microelectromechanical system (MEMS) gyros. The methods and systems include generating a map of motor bias and creating MEMS gyros based on the map of motor bias to achieve a higher yield of usable MEMS gyros per wafer. The systems include a processor (33) with components configured to determine paths of optimal motor bias for a given deep reactive ion etcher (22) on a wafer, a stepper (35) for imprinting a pattern for each gyro in an orientation that corresponds to the path of optimal motor bias each gyro is calculated to be most near on the wafer, and a deep reactive ion etcher (37) to etch the gyros in the wafer.