PROCESS FOR FORMING A PATTERNED FLUOROPOLYMER FILM ON A SUBSTRATE
Disclosed is a process for forming a patterned fluoropolymer film on a substrate by raised relief printing a fluoropolymer solution with a patterned raised relief printing plate, and drying the solvent from the solution to form the patterned fluoropolymer film. Such fluoropolymer films are useful as...
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| Format: | Patent |
| Sprache: | eng ; fre ; ger |
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| Zusammenfassung: | Disclosed is a process for forming a patterned fluoropolymer film on a substrate by raised relief printing a fluoropolymer solution with a patterned raised relief printing plate, and drying the solvent from the solution to form the patterned fluoropolymer film. Such fluoropolymer films are useful as antireflective or hydrophobic layers on substrates used in optical displays. |
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