EPITAXIAL REACTOR COOLING METHOD AND REACTOR COOLED THEREBY

The invention relates to a method for cooling the walls of the reaction chamber ( 2 ) of a reactor for chemical vapour deposition. The method consists in selectively cooling with water at least one predetermined zone of the wall of the chamber ( 2 ), to remove a different heat flow compared with the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	OGLIARI, VINCENZO, PRETI, FRANCO, TARENZI, GIUSEPPE, SPECIALE, NATALE, PUGLISI, MARCO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention relates to a method for cooling the walls of the reaction chamber ( 2 ) of a reactor for chemical vapour deposition. The method consists in selectively cooling with water at least one predetermined zone of the wall of the chamber ( 2 ), to remove a different heat flow compared with the adjacent zones so as to obtain substantially uniform temperature distribution of the reaction chamber ( 2 ). In a preferred embodiment, the selectively-cooled zone is the zone above the susceptor ( 5 ) and is delimited by two ribs ( 8, 9 ). The invention also includes a reactor and a reaction chamber ( 2 ) for carrying out the cooling method.