Process of gas-nitriding a surface of a workpiece without forming a bond layer, and a corresponding workpiece

In a compound layer-free method for nitriding a workpiece (WP) surface in a gaseous atmosphere by placing the WP in a process chamber supplied with fluids (specifically water and gases) to prepare and maintain the atmosphere, heating up under nitrogen and/or oxygen (preferably oxygen) and nitriding...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	BODE, HILMAR, CRUMMENAUER, JUERGEN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	In a compound layer-free method for nitriding a workpiece (WP) surface in a gaseous atmosphere by placing the WP in a process chamber supplied with fluids (specifically water and gases) to prepare and maintain the atmosphere, heating up under nitrogen and/or oxygen (preferably oxygen) and nitriding in first and second nitridation phases (N1, N2), the ammonia content in the atmosphere is reduced in the first and/or second nitridation phase. An independent claim is included for the WP subjected to the gas phase nitridation process.