Mixture containing 1, 3-Butadiene and process for producing the same

To provide a C4 fraction that contains significantly reduced amounts of butynes and methylallene and to provide a process for low-cost and effective production of ethers in which the C4 fraction is used as the starting material for a telomerization process. A mixture containing 25 to 80 mass% 1,3-bu...

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Hauptverfasser: IWASAKI, HIDEHARU, TOKUYASU, JIN
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:To provide a C4 fraction that contains significantly reduced amounts of butynes and methylallene and to provide a process for low-cost and effective production of ethers in which the C4 fraction is used as the starting material for a telomerization process. A mixture containing 25 to 80 mass% 1,3-butadiene, 13 to 68 mass% butenes and 2 to 15 mass% butanes with butynes and methylallene being contained in amounts of 50 ppm or less and 5 to 800 ppm, respectively