Method of manufacturing a semiconductor device

The present invention is related to a method of producing a semiconductor device and the resulting device. The method is suitable in the first place for producing high power devices, such as High Electron Mobility Transistors (HEMT), in particular HEMT-devices with multiplies source-gate-drain group...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DAS, JOHAN, RUYTHOOREN, WOUTER
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
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