EUV LIGHT SOURCE

An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having reflective portion comprised of the sa...

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Hauptverfasser: ERSHOV, ALEXANDER, I, BOWERING, NORBERT, R, FOMENKOV, IGOR, V, OLIVER, I., ROGER, PARTLO, WILLIAM, N, VIATELLA, JOHN, JACQUES, ROBERT, N
Format: Patent
Sprache:eng ; fre ; ger
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Zusammenfassung:An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having reflective portion comprised of the same materials as the EUV light collector reflective portion; a first EUV detector for detecting EUV light produced in the EUV plasma; and a second EUV detector for detecting EUV light reflected from the target sample.