Optical system and method for operating the same

In a process for operating an optical system, which consists of optical element(s) (A) at an electrical potential P0 for radiation in the extreme UV (EUV) or x-ray wavelength range and first electrode(s) (B), in which a potential difference (pd) is applied between (A) and (B), the novelty is that (B...

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Bibliographische Detailangaben
Hauptverfasser:	JANSEN, RIK, KLINKHAMER, FRISO, VAN DE RUNSTRAAT, ANNEMIEKE, WIERINGA, FOKKO PIETER, VAN MIERLO, HUBERT ADRIAAN, WEISS, MARKUS, MERTENS, BAS, NIJKERK, MICHIEL DAVID, WOLSCHRIJN, BASTIAAN, THEODOR
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	In a process for operating an optical system, which consists of optical element(s) (A) at an electrical potential P0 for radiation in the extreme UV (EUV) or x-ray wavelength range and first electrode(s) (B), in which a potential difference (pd) is applied between (A) and (B), the novelty is that (B) is at a first potential P11 less than P0 relative to (A) during irradiation of (A) in the operating mode (OM) of the system. Independent claims are included for the following: (1) optical system with a switch for producing a pd between (A) and (B); (2) normal incidence collector mirror for EUV or soft x-radiation; (3) optical system with normal incidence collector mirror.