Pellicle frame with heightened bonding surfaces

A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame (1002) defines first and second opposing surfaces. The first opposing surface (1032) defines a first opening (1202) and the second opposing surface (1034) defines a sec...

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Bibliographische Detailangaben
Hauptverfasser:	IVALDI, JORGE, LUO, FLORENCE, LAGANZA, JOSEPH
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame (1002) defines first and second opposing surfaces. The first opposing surface (1032) defines a first opening (1202) and the second opposing surface (1034) defines a second opening. A plurality of spacing members (1010) are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent (1020) seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.