Lithographic apparatus and device manufacturing method
A lithographic apparatus comprises a substrate table (WT) to hold a substrate (W) and a projection system (PS) to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system (LS) to supply a fluid between the substrate...
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| creator | FRENCKEN, MARK JOHANNES HERMANUS CUPERUS, MINNE VAN DER MEULEN, FRITS HOUKES, MARTIJN VAN DER TOORN, JAN-GERARD CORNELIS ARENDS, ANTONIUS HENRICUS BUTLER, HANS COX, HENRIKUS HERMAN MARIE DRAAIJER, EVERT HENDRIK JAN TEN KATE, NICOLAAS |
| description | A lithographic apparatus comprises a substrate table (WT) to hold a substrate (W) and a projection system (PS) to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system (LS) to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller (CON L ) to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset (PO) to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height. |
| format | Patent |
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The lithographic apparatus further comprises a fluid supply system (LS) to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller (CON L ) to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset (PO) to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120125&DB=EPODOC&CC=EP&NR=1708029B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120125&DB=EPODOC&CC=EP&NR=1708029B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FRENCKEN, MARK JOHANNES HERMANUS</creatorcontrib><creatorcontrib>CUPERUS, MINNE</creatorcontrib><creatorcontrib>VAN DER MEULEN, FRITS</creatorcontrib><creatorcontrib>HOUKES, MARTIJN</creatorcontrib><creatorcontrib>VAN DER TOORN, JAN-GERARD CORNELIS</creatorcontrib><creatorcontrib>ARENDS, ANTONIUS HENRICUS</creatorcontrib><creatorcontrib>BUTLER, HANS</creatorcontrib><creatorcontrib>COX, HENRIKUS HERMAN MARIE</creatorcontrib><creatorcontrib>DRAAIJER, EVERT HENDRIK JAN</creatorcontrib><creatorcontrib>TEN KATE, NICOLAAS</creatorcontrib><title>Lithographic apparatus and device manufacturing method</title><description>A lithographic apparatus comprises a substrate table (WT) to hold a substrate (W) and a projection system (PS) to project a patterned radiation beam onto a target portion of the substrate. 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The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDzySzJyE8vSizIyExWSCwoSCxKLCktVkjMS1FISS3LTE5VyE3MK01LTC4pLcrMS1fITQWqT-FhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAYbmBhYGRpZOhsZEKAEAfHUtpA</recordid><startdate>20120125</startdate><enddate>20120125</enddate><creator>FRENCKEN, MARK JOHANNES HERMANUS</creator><creator>CUPERUS, MINNE</creator><creator>VAN DER MEULEN, FRITS</creator><creator>HOUKES, MARTIJN</creator><creator>VAN DER TOORN, JAN-GERARD CORNELIS</creator><creator>ARENDS, ANTONIUS HENRICUS</creator><creator>BUTLER, HANS</creator><creator>COX, HENRIKUS HERMAN MARIE</creator><creator>DRAAIJER, EVERT HENDRIK JAN</creator><creator>TEN KATE, NICOLAAS</creator><scope>EVB</scope></search><sort><creationdate>20120125</creationdate><title>Lithographic apparatus and device manufacturing method</title><author>FRENCKEN, MARK JOHANNES HERMANUS ; CUPERUS, MINNE ; VAN DER MEULEN, FRITS ; HOUKES, MARTIJN ; VAN DER TOORN, JAN-GERARD CORNELIS ; ARENDS, ANTONIUS HENRICUS ; BUTLER, HANS ; COX, HENRIKUS HERMAN MARIE ; DRAAIJER, EVERT HENDRIK JAN ; TEN KATE, NICOLAAS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1708029B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2012</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>FRENCKEN, MARK JOHANNES HERMANUS</creatorcontrib><creatorcontrib>CUPERUS, MINNE</creatorcontrib><creatorcontrib>VAN DER MEULEN, FRITS</creatorcontrib><creatorcontrib>HOUKES, MARTIJN</creatorcontrib><creatorcontrib>VAN DER TOORN, JAN-GERARD CORNELIS</creatorcontrib><creatorcontrib>ARENDS, ANTONIUS HENRICUS</creatorcontrib><creatorcontrib>BUTLER, HANS</creatorcontrib><creatorcontrib>COX, HENRIKUS HERMAN MARIE</creatorcontrib><creatorcontrib>DRAAIJER, EVERT HENDRIK JAN</creatorcontrib><creatorcontrib>TEN KATE, NICOLAAS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FRENCKEN, MARK JOHANNES HERMANUS</au><au>CUPERUS, MINNE</au><au>VAN DER MEULEN, FRITS</au><au>HOUKES, MARTIJN</au><au>VAN DER TOORN, JAN-GERARD CORNELIS</au><au>ARENDS, ANTONIUS HENRICUS</au><au>BUTLER, HANS</au><au>COX, HENRIKUS HERMAN MARIE</au><au>DRAAIJER, EVERT HENDRIK JAN</au><au>TEN KATE, NICOLAAS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Lithographic apparatus and device manufacturing method</title><date>2012-01-25</date><risdate>2012</risdate><abstract>A lithographic apparatus comprises a substrate table (WT) to hold a substrate (W) and a projection system (PS) to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system (LS) to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller (CON L ) to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset (PO) to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; fre ; ger |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Lithographic apparatus and device manufacturing method |
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