Lithographic apparatus and device manufacturing method

A lithographic apparatus comprises a substrate table (WT) to hold a substrate (W) and a projection system (PS) to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system (LS) to supply a fluid between the substrate...

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Bibliographische Detailangaben
Hauptverfasser:	FRENCKEN, MARK JOHANNES HERMANUS, CUPERUS, MINNE, VAN DER MEULEN, FRITS, HOUKES, MARTIJN, VAN DER TOORN, JAN-GERARD CORNELIS, ARENDS, ANTONIUS HENRICUS, BUTLER, HANS, COX, HENRIKUS HERMAN MARIE, DRAAIJER, EVERT HENDRIK JAN, TEN KATE, NICOLAAS
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus comprises a substrate table (WT) to hold a substrate (W) and a projection system (PS) to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system (LS) to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller (CON L ) to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset (PO) to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.