Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus

A method for measuring information provided by a substrate (W) is disclosed. The substrate (W) includes a feature (300) that has been created by a lithographic apparatus. The method includes projecting a beam of light (100) onto a marker (200) disposed above and/or near the feature (300) on the subs...

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Bibliographische Detailangaben
Hauptverfasser:	LALBAHADOERSING, SANJAYSINGH, VAN DE VIN, COEN, PIETERS, MARCO JOHANNES ANNEMARIE, HAUSCHILD, JAN
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method for measuring information provided by a substrate (W) is disclosed. The substrate (W) includes a feature (300) that has been created by a lithographic apparatus. The method includes projecting a beam of light (100) onto a marker (200) disposed above and/or near the feature (300) on the substrate (W), and detecting information provided by the marker (200) with a sensor. A coating (330) is disposed on the substrate (W) so that the coating (330) lies between the beam of light (100) and the feature (300) to substantially prevent the beam of light (100) from being reflected by the feature (300) and causing an inaccurate readout of the information provided by the marker (200).