$Process for the electrochemical removal of refractory metals or their alloys and use of a solution for this process$

Process for the electrochemical removal of refractory metals or their alloys and use of a solution for this process

In a method for electrochemical erosion of refractory metal (or alloy), by connecting a workpiece of refractory metal (or alloy) as anode with a conductive erosion tool as cathode, with an electrolyte located between the anode and cathode, and applying an electrical potential between the the anode a...

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Bibliographische Detailangaben
Hauptverfasser:	KRAUSS, WOLFGANG, KONYS, JUERGEN, HOLSTEIN, NILS
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINE TOOLS MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING METAL-WORKING NOT OTHERWISE PROVIDED FOR METALLURGY PERFORMING OPERATIONS POLISHING PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS SEMICONDUCTOR DEVICES SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL TRANSPORTING WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OFELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKESTHE PLACE OF A TOOL
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Beschreibung
Zusammenfassung:	In a method for electrochemical erosion of refractory metal (or alloy), by connecting a workpiece of refractory metal (or alloy) as anode with a conductive erosion tool as cathode, with an electrolyte located between the anode and cathode, and applying an electrical potential between the the anode and cathode so that current flows through the workpiece, electrolyte and tool and part of the workpiece is removed, the electrolyte is a solution (I) containing a conductivity salt and a base and having a pH of 9-13. An independent claim is included for the use of the solution (I) as electrolyte in a method as above.