IMPRINT LITHOGRAPHY TEMPLATES HAVING ALIGNMENT MARKS

One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	EKERDT, JOHN G, SMITH, BRITAIN J, CHOI, BYUNG J, BAILEY, TODD C, COLBURN, MATTHEW E, SREENIVASAN, SIDLGATA V, WILLSON, CARLTON G, JOHNSON, STEPHEN C
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.