Alloy deposition by PVD

A method for depositing a first material on a substrate (108) includes providing the substrate (108) in a deposition chamber. A molten body (164) is formed between the substrate and a source of the first material by melting one or more second materials. A flow of the first material is passed through...

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Bibliographische Detailangaben
Hauptverfasser:	SHELKOVOI, ANATOLI N, MALASHENKO, IGOR S, BELOUSOV, IGOR V, KINSTLER, MONIKA D, SERGIYENKO, GREGORY A, RUTZ, DAVID A, MEMMEN, ROBERT L
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Beschreibung
Zusammenfassung:	A method for depositing a first material on a substrate (108) includes providing the substrate (108) in a deposition chamber. A molten body (164) is formed between the substrate and a source of the first material by melting one or more second materials. A flow of the first material is passed through the molten body (164) and from the molten body (164) to the substrate (108) as a vapor flow. An essentially non-expending portion of the molten body comprises an alloy having a melting temperature below a melting temperature of the first material.