PLASMA GENERATING ELECTRODE, PLASMA REACTOR, AND EXHAUST GAS PURIFYING DEVICE

A plasma generating electrode 1 of the present invention includes a plurality of unit electrodes 2 hierarchically layered at predetermined intervals, the unit electrodes 2 including a deficient unit electrode 2b in which a conductive film 4 has an absent portion and a normal unit electrode 2a in whi...

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Bibliographische Detailangaben
Hauptverfasser:	MIYAIRI, YUKIO, DOSAKA, KENJI, HATANO, TATSUHIKO, IWAMA, KEIZO, SAKUMA, TAKESHI, FUJIOKA, YASUMASA, MASUDA, MASAAKI, IMANISHI, YUUICHIRO
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY COMBUSTION APPARATUS COMBUSTION PROCESSES ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINE PLANTS IN GENERAL FLUES GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNALCOMBUSTION ENGINES GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES ORENGINES IN GENERAL HEATING LIGHTING MACHINES OR ENGINES IN GENERAL MECHANICAL ENGINEERING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTIONRESIDUES SEPARATION STEAM ENGINES THEIR RELEVANT APPARATUS TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	A plasma generating electrode 1 of the present invention includes a plurality of unit electrodes 2 hierarchically layered at predetermined intervals, the unit electrodes 2 including a deficient unit electrode 2b in which a conductive film 4 has an absent portion and a normal unit electrode 2a in which the conductive film 4 does not have an absent portion. Spaces V formed between the unit electrodes 2 include a normal space Va formed so that the distance between conductive films 4 corresponds to the distance between the unit electrodes 2 and a deficient space Vb formed so that the distance between the conductive films 4 is greater than the distance between the conductive films 4 in the normal space Va. The plasma generating electrode 1 of the present invention can efficiently treat a plurality of predetermined components contained in a treatment target fluid by utilizing different types of plasma suitable for respective reactions by causing the treatment target fluid to flow only once.