Method for the protection of an optical element, device manufacturing method, and lithographic apparatus including an optical element

Method for the protection of an optical element, device manufacturing method, and lithographic apparatus including an optical element

A method for the removal of a deposition on an optical element of an apparatus including the optical clement includes producing hydrogen radicals from H 2 from an H 2 -containing gas and bringing the optical clement with deposition into contact with at least part of the hydrogen radicals and removin...

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Bibliographische Detailangaben
Hauptverfasser: ZALM, PETER CORNELIS, SPEE, CAROLUS IDA MARIA ANTONIUS, KLUNDER, DERK JAN WILFRED, BANINE, VADIM YEVGENYEVICH, VAN HERPEN, MAARTEN MARINUS JOHANNES WILHELMUS, MOORS, JOHANNES HUBERTUS JOSEPHINA
Format: Patent
Sprache:eng ; fre ; ger
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
CLEANING
CLEANING IN GENERAL
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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Beschreibung
Zusammenfassung:A method for the removal of a deposition on an optical element of an apparatus including the optical clement includes producing hydrogen radicals from H 2 from an H 2 -containing gas and bringing the optical clement with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical clement includes providing a cap layer to the optical element by a deposition process and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The hydrogen radicals are generated from H 2 from the H 2 containing gas by a filament, radiation, or a catalyst configured to convert H 2 into hydrogen radicals.