Method and masks for reducing the impact of stray light in optical lithography

The present invention discloses a method for reducing the influence of the spread of the transmitted light on the feature size during optical lithography. The method comprises at least two irradiation steps. During a first irradiation step the resist is exposed with the original mask, i.e. comprisin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEUNISSEN, PETER, YOUNGANG, KIM
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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