THIN FILM FORMING APPARATUS AND METHOD FOR FORMING THIN FILM

A thin film forming apparatus comprises: a first electrode and a second electrode whose respective discharge surfaces face each other to form a discharge space to generate a high frequency electric field across the discharge space; and a gas supply unit for supplying a gas including a thin film form...

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Bibliographische Detailangaben
Hauptverfasser: FUKAZAWA, KOJI, MAEDA, KIKUO, TODA, YOSHIROU
Format: Patent
Sprache:eng ; fre ; ger
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Beschreibung
Zusammenfassung:A thin film forming apparatus comprises: a first electrode and a second electrode whose respective discharge surfaces face each other to form a discharge space to generate a high frequency electric field across the discharge space; and a gas supply unit for supplying a gas including a thin film formation gas to the discharge space so that the high frequency electric field activate the gas, and for forming a thin film on the substrate by exposing the substrate to the activated gas. Further, the thin film forming apparatus includes a film transporting mechanism which transports a protecting film for preventing at least one of the first electrode and the second electrode from being exposed to the activated gas, while the protecting film is contacted with at least one of the discharge surfaces of the first electrode and second electrode with at least a part of a surface other than the discharge surface which continues to the discharge surface.