APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

Bibliographische Detailangaben

Hauptverfasser:	ADEL, MICHAEL, WACK, DAN, FRIEDMANN, MICHAEL, BAREKET, NOAH, FABRIKANT, ANATOLY, BEVIS, CHRISTOPHER, F, ZALICKI, PIOTR, GROSS, KEN, GOLOVANEVSKY, BORIS, FIELDEN, JOHN, SMITH, IAN, DECECCO, PAOLA, MIEHER, WALTER, D, LEVY, ADY, DZIURA, THADDEUS, G
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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