DEVICE AND METHOD FOR THE EVAPORATIVE DEPOSITION OF A HIGH-TEMPERATURE SUPERCONDUCTOR IN A VACUUM WITH CONTINUOUS MATERIAL INTRODUCTION

Device for evaporating a high temperature superconductor (13) on a substrate in a vacuum comprises a refilling unit (5) for receiving a supply of high temperature superconductor material, an evaporation unit (1) for evaporating the high temperature superconductor material in an evaporating zone with...

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Bibliographische Detailangaben
1. Verfasser:	KINDER, HELMUT
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Device for evaporating a high temperature superconductor (13) on a substrate in a vacuum comprises a refilling unit (5) for receiving a supply of high temperature superconductor material, an evaporation unit (1) for evaporating the high temperature superconductor material in an evaporating zone with a stream (2) of an energy transfer medium, and a conveying unit (3) for continuously conveying the superconductor material from the refilling unit to an evaporation zone so that the superconductor material is evaporated with leaving any residue. An Independent claim is also included for a process for evaporating a high temperature superconductor on a substrate in a vacuum.