CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER

CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER

The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge...

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Hauptverfasser: MEISNER, John, ERSHOV, Alexander I, LIPCON, Jacob, P, SANDSTROM, Richard, L, RULE, John, A, MELCHER, Paul, C, FALLON, John, P, JACQUES, Robert, N, NESS, Richard, M, PARTLO, William, N, ISHIHARA, Toshihiko
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Sprache:eng ; fre ; ger
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BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRICITY
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creator MEISNER, John
ERSHOV, Alexander I
LIPCON, Jacob, P
SANDSTROM, Richard, L
RULE, John, A
MELCHER, Paul, C
FALLON, John, P
JACQUES, Robert, N
NESS, Richard, M
PARTLO, William, N
ISHIHARA, Toshihiko
description The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP1540783B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP1540783B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP1540783B13</originalsourceid><addsrcrecordid>eNrjZDBx9vcLCfL3UQiODA5x9VVw8w9ScFQICfdXcPZw9HVyDVJwdwxWcPEMBnKD3F0VfByDXYN4GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakm8a4ChqYmBuYWxk6ExEUoAXxwmsw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER</title><source>esp@cenet</source><creator>MEISNER, John ; ERSHOV, Alexander I ; LIPCON, Jacob, P ; SANDSTROM, Richard, L ; RULE, John, A ; MELCHER, Paul, C ; FALLON, John, P ; JACQUES, Robert, N ; NESS, Richard, M ; PARTLO, William, N ; ISHIHARA, Toshihiko</creator><creatorcontrib>MEISNER, John ; ERSHOV, Alexander I ; LIPCON, Jacob, P ; SANDSTROM, Richard, L ; RULE, John, A ; MELCHER, Paul, C ; FALLON, John, P ; JACQUES, Robert, N ; NESS, Richard, M ; PARTLO, William, N ; ISHIHARA, Toshihiko</creatorcontrib><description>The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.</description><language>eng ; fre ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; DEVICES USING STIMULATED EMISSION ; ELECTRICITY</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170118&amp;DB=EPODOC&amp;CC=EP&amp;NR=1540783B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170118&amp;DB=EPODOC&amp;CC=EP&amp;NR=1540783B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MEISNER, John</creatorcontrib><creatorcontrib>ERSHOV, Alexander I</creatorcontrib><creatorcontrib>LIPCON, Jacob, P</creatorcontrib><creatorcontrib>SANDSTROM, Richard, L</creatorcontrib><creatorcontrib>RULE, John, A</creatorcontrib><creatorcontrib>MELCHER, Paul, C</creatorcontrib><creatorcontrib>FALLON, John, P</creatorcontrib><creatorcontrib>JACQUES, Robert, N</creatorcontrib><creatorcontrib>NESS, Richard, M</creatorcontrib><creatorcontrib>PARTLO, William, N</creatorcontrib><creatorcontrib>ISHIHARA, Toshihiko</creatorcontrib><title>CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER</title><description>The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBx9vcLCfL3UQiODA5x9VVw8w9ScFQICfdXcPZw9HVyDVJwdwxWcPEMBnKD3F0VfByDXYN4GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakm8a4ChqYmBuYWxk6ExEUoAXxwmsw</recordid><startdate>20170118</startdate><enddate>20170118</enddate><creator>MEISNER, John</creator><creator>ERSHOV, Alexander I</creator><creator>LIPCON, Jacob, P</creator><creator>SANDSTROM, Richard, L</creator><creator>RULE, John, A</creator><creator>MELCHER, Paul, C</creator><creator>FALLON, John, P</creator><creator>JACQUES, Robert, N</creator><creator>NESS, Richard, M</creator><creator>PARTLO, William, N</creator><creator>ISHIHARA, Toshihiko</creator><scope>EVB</scope></search><sort><creationdate>20170118</creationdate><title>CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER</title><author>MEISNER, John ; ERSHOV, Alexander I ; LIPCON, Jacob, P ; SANDSTROM, Richard, L ; RULE, John, A ; MELCHER, Paul, C ; FALLON, John, P ; JACQUES, Robert, N ; NESS, Richard, M ; PARTLO, William, N ; ISHIHARA, Toshihiko</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP1540783B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>2017</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>MEISNER, John</creatorcontrib><creatorcontrib>ERSHOV, Alexander I</creatorcontrib><creatorcontrib>LIPCON, Jacob, P</creatorcontrib><creatorcontrib>SANDSTROM, Richard, L</creatorcontrib><creatorcontrib>RULE, John, A</creatorcontrib><creatorcontrib>MELCHER, Paul, C</creatorcontrib><creatorcontrib>FALLON, John, P</creatorcontrib><creatorcontrib>JACQUES, Robert, N</creatorcontrib><creatorcontrib>NESS, Richard, M</creatorcontrib><creatorcontrib>PARTLO, William, N</creatorcontrib><creatorcontrib>ISHIHARA, Toshihiko</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MEISNER, John</au><au>ERSHOV, Alexander I</au><au>LIPCON, Jacob, P</au><au>SANDSTROM, Richard, L</au><au>RULE, John, A</au><au>MELCHER, Paul, C</au><au>FALLON, John, P</au><au>JACQUES, Robert, N</au><au>NESS, Richard, M</au><au>PARTLO, William, N</au><au>ISHIHARA, Toshihiko</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER</title><date>2017-01-18</date><risdate>2017</risdate><abstract>The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRICITY
title CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER
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