CONTROL SYSTEM FOR A TWO CHAMBER GAS DISCHARGE LASER

The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge...

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Bibliographische Detailangaben
Hauptverfasser:	MEISNER, John, ERSHOV, Alexander I, LIPCON, Jacob, P, SANDSTROM, Richard, L, RULE, John, A, MELCHER, Paul, C, FALLON, John, P, JACQUES, Robert, N, NESS, Richard, M, PARTLO, William, N, ISHIHARA, Toshihiko
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES USING STIMULATED EMISSION ELECTRICITY
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Beschreibung
Zusammenfassung:	The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.