EUV source

The source has a radiation zone (3) situated in a radiation chamber (1) connected to turbomolecular pumps (11). A collector device (13) for collecting and conditioning extreme ultraviolet (EUV) radiation emitted by a radiation generating material, is placed in a transmission chamber (2) that is conn...

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Bibliographische Detailangaben
Hauptverfasser:	MORPAIN, MATTHIEU, RIVAL, JEAN-LUC, BARTHOD, BENOIT
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	The source has a radiation zone (3) situated in a radiation chamber (1) connected to turbomolecular pumps (11). A collector device (13) for collecting and conditioning extreme ultraviolet (EUV) radiation emitted by a radiation generating material, is placed in a transmission chamber (2) that is connected to turbomolecular pumps (12). The chamber (2) is connected to the chamber (1) through a diaphragm (4) having reduced dimension. The turbomolecular pumps (11) maintain a pressure that is higher than the pressure maintained by the turbomolecular pumps (12). The diaphragm is provided at proximity of the radiation zone (3) and is oriented along an optical axis. An independent claim is also included for a photolithography device comprising extreme ultraviolet radiation source.