SCATTER-FREE UV OPTICAL FLUORIDE CRYSTAL ELEMENTS FOR BELOW 200 NM LASER LITHOGRAPHY AND METHODS

The invention provides a scatter-free below 200 nm wavelength transmitting optical fluoride lithography crystal for use with below 200 nm laser light. The invention includes making below 200 nm wavelength transmitting optical fluoride lithography crystals with a calcium fluoride feedstock in a low-c...

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Bibliographische Detailangaben
Hauptverfasser:	PRICE, MICHAEL, W, RODRIGUEZ, GAIL, A
Format:	Patent
Sprache:	eng ; fre ; ger
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMISTRY CRYSTAL GROWTH METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	The invention provides a scatter-free below 200 nm wavelength transmitting optical fluoride lithography crystal for use with below 200 nm laser light. The invention includes making below 200 nm wavelength transmitting optical fluoride lithography crystals with a calcium fluoride feedstock in a low-chlorine graphite optical fluoride crystal crucible having a chlorine content concentration less than 0.3 ppm Cl by weight. The method includes melting calcium fluoride feedstock in the